Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

Abstract

For the first time a top-down process was used to control the spatial location of Metal–Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol–gel surface, with exposure hardening the sol–gel by inducing crosslinking while leaving the frameworks intact.